Nucleation and Growth of Crystalline Grains in RF-Sputtered TiO2Films
نویسندگان
چکیده
منابع مشابه
MEMS prototyping using RF sputtered films
In the present work, the deposition and characterization of dielectric, piezoelectric, semiconductor and conductor films by RF diode / RF magnetron sputtering process for applications in MEMS fabrication have been reported. Thin films of silicon dioxide, silicon nitride, amorphous silicon, zinc oxide and lanthanum doped lead zirconate titanate (PLZT) were prepared by RF sputtering process and e...
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Indium tin oxide (ITO) films have been deposited onto glass substrates by ifmagnetron sputtering without insitu substrate heating. The as-deposited films have an electrical resistivity of 5x1O a-cm, visible transmittance of about 85%, and infrared (IR) reflectance of above 80% at 5 jim. The effect of sputtering parameters on the deposition rate and the electrical and optical properties of ITO f...
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Background : Zinc oxide (ZnO) is a wide, direct band gap II-VI oxide semiconductor. ZnO has large exciton binding energy at room temperature, and it is a good host material for obtaining visible and infrared emission of various rare-earth ions. Methods : Europium oxide (Eu2O3) doped ZnO films are prepared on quartz substrate using radio frequency (RF) magnetron sputtering with doping concentrat...
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ژورنال
عنوان ژورنال: Research Letters in Nanotechnology
سال: 2009
ISSN: 1687-6849,1687-6857
DOI: 10.1155/2009/280797